Together with its industrial partners, the Fraunhofer Institute of Integrated Systems and Device Technology (IISB), Erlangen, Germany, is developing new equipment and processes for semiconductor manufacturing, as well as simulation tools to characterize the process steps involved in modern microelectronics manufacturing. As a center of competence for power electronics, IISB develops power electronic devices and systems - from discrete diodes up to complex prototypes for switch-mode power supplies, drives etc.
For our simulation department, we are looking for a PhD student or a research associate for the development and application of simulation tools for lithography and etching processes.
In the field of lithography simulation, IISB is developing models and algorithms which describe the diffraction of light from advanced photomasks, the imaging of these masks with a projection system, the interaction of the projected light and the photoresist, and the chemical reactions inside the photoresist. The simulation tools are used to optimize existing processes, and to evaluate options for future technologies. The work of the PhD student or the research associate will focus on the development and application of physical models and software for the simulation of the impact of the mask fabrication process on the lithographic process performance. This includes rigorous modeling of light diffraction from masks taking into account their realistic shape.
Regarding the simulation of etching, the project activities will be focused on the development and implementation of models describing the etching process for lithography mask fabrication. The simulation models will be based on the physical and chemical phenomena contributing to the etching process. Of particular importance is the transfer of the simulation results to lithography simulation to study the impact of the mask geometry on lithography performance.
We offer challenging research and development tasks in an international research environment with many contacts to institutes and companies. We are looking for candidates with a background in at least one of the following areas: Theoretical or experimental optics (rigorous diffraction theory, electromagnetic field simulation, imaging), computing (geometric modeling, programming), semiconductor technology (preferably regarding lithography or etching processes), numerical methods (ideally with experience in application to physical modeling).
Contract, salary and social benefits are according to TVÖD.
Contact:
Dr. Andreas Erdmann
Fraunhofer Institute of Integrated Systems and Device Technology (IISB)
Schottkystrasse 10
91058 Erlangen
Germany
andreas.erdmann@iisb.fraunhofer.de
Tel.: 09131/761-258
Fax: 09131/761-212
Information about the IISB can be found under www.iisb.fraunhofer.de
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