TUTORIALS September 17, 2006 Antwerp Hilton, Belgium
CONFERENCE September 18-20, 2006 Antwerp Hilton, Belgium
STUDENT PARTICIPATION STRONGLY ENCOURAGED!
reduced student rates
best student paper award
The Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) is a biannual event. The next edition will be held on September 18-20, 2006 in the Hilton Hotel in downtown Antwerp. It is the purpose of the UCPSS-symposium to increase the level of understanding on ultra-clean processing technology in all steps of the IC-production. The conference consists of invited presentations as well as selected contributing presentations and posters. The issues to be addressed include, but are not limited to, the following topics:
surface conditioning for sensitive processes (e.g. high-k dielectrics, Ge surfaces)
chemical and physical cleaning in liquid, gaseous and supercritical ambient
trade-offs between cleaning performance, substrate damage and etching
application-specific cleans (e.g. epitaxy, SiGe, CVD, wafer backside)
cleaning and surface treatments at the interconnect level, cleaning of low-k material, post-CMP cleaning
dry-etch resist strip and polymer removal
contamination/particle control and its relation with process performance
controlled environment during processing, equipment for wafer cleaning
surface chemistry, passivation, and characterization of Si, Ge, and GaAs
effects of Si-wafer defects and Si-surface topography on process yield
process and contamination diagnostics, in-situ monitoring and process control
general issues in ultra-clean technology, ultra-pure materials and supply systems
environmentally friendly technologies and mass balance equations
IIf you want to be informed on the next UCPSS edition (2006), please enter your affiliation and e-mail address via the mailing list or contact the conference secretariat:
UCPSS - Momentum
Grensstraat 8, B-3010 Leuven, Belgium
Tel +32 (0)16 40 45 55 - fax +32 (0)16 40 35 51
ucpss@momentum-pco.be
http://www.ucpss.org/index.htm
