The Fraunhofer-Center Nanoelectronic Technologies (CNT) offers 7 PhD positions:
1. PhD position: Investigation of wet and plasma based processes for cleaning and treatment of wafers in the copper back end of line in semiconductor manufacturing for different applications. The main focus of the thesis will be the wet and dry cleaning/ resist removal of wafers with standard low-k and ultra low-k materials in the copper backend of microprocessor manufacturing in sub 100 nm structures without causing damage to these materials as well as the repair of already damaged ultra low-k materials in these structures.
2. PhD position: Advanced Annealing for high speed CMOS - Process development
Main focus will be the Advanced Annealing for high speed CMOS-Development of processes You will gain experience regarding tool handling (primarily assembly instructions and functionality of the components) ,support of the process qualifications, -monitoring ( SPC) as well as a setup of a Trace Data Collection. In this context you work close together with the AMD Diffusion/Integrati on Team and the tool supplier.
3. PhD position: Characterization of ALD-layers
The aim of the PhD project is to study the growth behavior of ALD films. The project comprises both the deposition of the films and their characterization with in-situ XPS. Existing evaluation routines will be applied, their limitations will be assessed and improved routines will be developed where necessary.
4. PhD position: Characterization of thin films with SIMS
The analysis-procedures for the composition of very thin high-k dielectric films will be developed based on SIMS, TOF-SIMS, ARXPS, XRR, XRD, AES. The procedures include the preparation of standards and the assessment of sensitivity and repeatability. Based on these results and with focus on SIMS the quantitative element analysis will be evaluated also for analysis of stack systems with electrodes and dielectrics for different devices.
5. PhD position: Preparation and characterization of new dielectrics for DRAM application using ALD
The aim of the project is the identification of new high-k dielectrics for the next generations of DRAM capacitors. The preparation of the thin film capacitors will be realized with Atomic Layer Deposition (ALD). One task is the investigation and improvement of the ALD processes using new chemical routes.
6. PhD student position: Development of new technological concepts for ALD
This project is focused on a better technological understanding of Atomic Layer Deposition (ALD) processes. Technological investigations comprise testing, evaluating and improving of precursor delivery systems and basic studies regarding to the influence of the ALD chamber design. A main challenge is to find correlations between technological and process parameters and the layer homogeneity. Simulation of fluid dynamics and ALD process steps will help to improve the chamber design.
7. PhD student position: Thin high-k dielectric films deposition based on Atomic Layer Deposition (ALD)
Main target of the PhD Thesis will be research in the deposition of very thin high-k dielectric films based on Atomic Layer Deposition (ALD) technique. The candidate will perform the analysis of the ALD growth mechanism for various material systems and conduct the physical and electrical characterization of the deposited layers.
We invite graduate students from the field of materials science, physics, chemistry, mechanical und electrical engineering and related areas to send in their applications including covering letter, CV, copies of diploma and related certificates / letter of recommendation / job references solely via e-mail to Martin Landgraf. Details on each job position can be found at http://www.cnt. fraunhofer. de/fhg/cnt/ Jobs/index. jsp
Please send your application to:
Contact: Martin Landgraf
Address: Please send applications only by email
city: Dresden
PostCode: 01099
Phone: 0351-2607-3004
Email: jobs@cnt.fraunhofer .de
Need further information? Please contact:
contact: Martin Landgraf
Address: Please send applications only by email
city: Dresden
PostCode : 01099
Phone: 0351-2607-3004
Email: jobs@cnt.fraunhofer .de
URL: http://www.cnt. fraunhofer. de
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